1. Pretreatment system → reverse osmosis system → intermediate water tank → coarse mixed bed → fine mixed bed → pure water tank → pure water pump → ultraviolet sterilizer → polished mixed bed → precision filter → water point (≥18MΩ.CM) (traditional Craft)
  2. pretreatment → reverse osmosis → intermediate water tank → water pump → EDI device → purified water tank → pure water pump → ultraviolet sterilizer → polishing mixed bed → 0.2 or 0.5 μm precision filter → water point (≥18MΩ.CM) (the latest technology)
  3. Pretreatment→first-stage reverse osmosis→dosing machine (PH adjustment)→intermediate water tank→second-stage reverse osmosis (positive charge reverse osmosis membrane)→pure water tank→pure water pump→EDI device→ultraviolet sterilizer→0.2 or 0.5μm precision filter → water point (≥17MΩ.CM) (the latest technology)
  4. Pretreatment → reverse osmosis → intermediate water tank → water pump → EDI device → pure water tank → pure water pump → ultraviolet sterilizer → 0.2 or 0.5 μm precision filter → water point (≥15MΩ.CM) (the latest technology)
  5. Pretreatment system → reverse osmosis system → intermediate water tank → pure water pump → coarse mixed bed → fine mixed bed → ultraviolet sterilizer → precision filter → water point (≥15MΩ.CM) (traditional process)

Semiconductor ultrapure water equipment, as the name suggests, is mainly used for semiconductor processing and production. The above are several water production processes for semiconductor ultrapure water equipment.

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