Process flow of ultrapure water equipment in electronics factory

Process flow of ultrapure water equipment in electronics factory 

1. Pretreatment system → reverse osmosis system → intermediate water tank → coarse mixed bed → fine mixed bed → pure water tank → pure water pump → ultraviolet sterilizer → polished mixed bed → precision filter → water object (≥18MΩ.CM) (traditional Craft)
2. pretreatment → reverse osmosis → intermediate water tank → water pump → EDI device → purified water tank → pure water pump → ultraviolet sterilizer → polishing mixed bed → 0.2 or 0.5 μm precision filter → water object (≥18MΩ.CM) (the latest technology)
3. Pretreatment→first-stage reverse osmosis→dosing machine (PH adjustment)→intermediate water tank→second-stage reverse osmosis (positive charge reverse osmosis membrane)→pure water tank→pure water pump→EDI device→ultraviolet sterilizer→0.2 or 0.5μm precision filter → water object (≥17MΩ.CM) (the latest technology)
4. Pretreatment → reverse osmosis → intermediate water tank → water pump → EDI device → pure water tank → pure water pump → ultraviolet sterilizer → 0.2 or 0.5 μm precision filter → water object (≥15MΩ.CM) (the latest technology)
5. Pretreatment system → reverse osmosis system → intermediate water tank → pure water pump → coarse mixed bed → fine mixed bed → ultraviolet sterilizer → precision filter → water object (≥15MΩ.CM) (traditional process)

Further reading:

• Process flow of semiconductor ultrapure water equipment
• Process flow of ultrapure water equipment in electroplating industry
• Process flow of coating and electroplating pure water equipment
• Process description of laboratory ultrapure water equipment